Pure Air Systems POU Abatement Recommendation
PROCESS LIKELY PROCESS/GAS BYPRODUCTS POU TECHNOLOGY WHY POU
TECHNOLOGY?
Aluminum Metal Etch Cl2/BCl3/HCl/CF4/CHF3/SF6/
AlCl3/HF		 No PFC: E.DOC – SC
PFC: E.DOC – TH		 Solids buildup, Toxic and
PFC.
Poly Etch HBr/Cl2/NF3/SF6/NH3/HF/
SiF4, etc.		 No PFC: E.DOC – SC Corrosive and Toxic.
Oxide Etch CHF3/CF4/C2F6/C4F8/C5F8/HF/SiF4,
etc.		 E.DOC – TH Corrosive, Toxic and PFC.
Nitride Etch SF6/CF4/CHF3/HF/SiF4, etc. E.DOC – TH Corrosive, Toxic and PFC.
Tungsten Etchback SF6/HF/WF6 No PFC: E.DOC – SC Solids buildup.
LPCVD Nitride DCS/NH3 E.DOC – SC Solids buildup, Toxic and
flammable gases.
LPCVD Poly SiH4/Si2/H6 S.DOC Pyrophoric gases and
Solids buildup.
LPCVD Doped Poly SiH4/PH3 S.DOC Pyrophoric gas and
extremely toxic gas. May
have solids build-up.
LPCVD Oxide TEOS S.DOC Toxic gas. High solids
generation.
Oxide TEOS CVD TEOS/C2F6/NF3/F2/HF/SiF4/
CF4		 E.DOC – TH Toxic gas. High solids
generation PFC.
BPTEOS CVD (remote
NF3 clean)		 TEOS/TEB/TEPO/NF3/F2/
SiF4/HF		 E.DOC – TH Flammable gases, solids
buildup and corrosion.
PECVD Oxide
(Remote NF3 clean)		 SiH4/N2O/NF3/F2/SiF4/HF E.DOC – TH Pyrophoric gas and solids
buildup.
PECVD Nitride/Oxynitride
(Remote NF3 clean)		 SiH4/NH3/N2O/NF3/F2/SiF4/HF E.DOC – TH Pyrophoric gas, solids
buildup and corrosion.
HDP
(Remote NF3 clean)		 SiH4/H2/NF3/F2/SiF4/HF E.DOC – TH Pyrophoric gas, solids
buildup and corrosion.